Antimony tin oxide (ATO) has been extensively studied in energy-saving buildings, photoelectric devices and military stealth technology due to its inherent high visible light transmittance, good infrared shielding performance and electrical conductivity. In this review, progresses in synthesis of ATO nanomaterials and their thin films in recent years are presented. The fabrication methods of ATO nanomaterials such as precipitation method, sol-gel method, hydrothermal method or solvent thermal method, as well as their films such as spray pyrolysis method, pulsed laser deposition method, magnetron sputtering method and coating method are reviewed in detail. The factors of antimony doping concentration, drying method, temperature, oxygen flow, thickness of film on the nanostructures and photoelectric properties of ATO and ATO films are discussed. The application of ATO films in the fields of optoelectronics, architecture and military are also introduced. Finally, the advantages and disadvantages of various fabrication methods are summarized, and current challenges faced in practical application and the trend of future development are presented and discussed.