聚焦离子束（FIB）及其应用-中国材料进展

文章信息/Info

Author(s):: Han Wei' target="_blank" rel="external">’serif’">Wei ; Xiao Siqun; (FEI Company, Unit 102, Building No 8, Micro-electronics Port, No.690 Bibo Road, Pudong, Shanghai 201203, China)

摘要:: 本文介绍了聚焦离子束（FIB）的原理及结构，详细讨论了电子束与离子束组成的双束系统的特点及应用。特别强调了最新的双束技术发展趋势。详细论述了离子束的三种常用功能及应用，介绍了气体注入系统(GIS)系统的应用及发展现状。讨论超高分辨率扫描电镜在双束中的重要应用。本文详细论述了双束系统在科研和工业生产中的重要应用：如微纳加工、透射电镜的薄样品制备、三维表征、电路编辑等方面的应用。讨论各种各种常用微纳加工方法的优缺点，介绍了双束在薄样品制备方面独特的优势，介绍了三维图像、三维能谱、三维EBSD的发展及最新应用进展。介绍了双束在半导体行业的重要应用，展示线路编辑的实现方法及相关技术。最后简要介绍了在中国科研领域双束的应用状况，介绍了中国科研工作者利用双束获得的重要成果。

Abstract:: In this article the theory and structure of FIB are introduced. The features and applications of Dualbeam system composed by electron beam and focused ion beam are discussed in details. The trend of Duelbeam technology is emphasized intensively. Three main functions and applications are discussed in details. The application and present progress of gas injection system (GIS) are introduced. The important application of ultra-high resolution scanning electron microscope are discussed. The important applications of Dualbeam in scientific research and industrial fabrication are discussed: Micro/Nano fabrication, TEM thin sample, 3D characterization, circuit edit. The advantages and of weakness of common methods for nanofabrication are discussed. The unique virtue of Dualbeam in processing thin samples are introduced. The new application progresses in 3D imaging, 3D EDS, 3D EBSD are introduced. The important application of Dualbeam in semiconductor industry is introduced. The method and related technology for circuit edit are illustrated. In the end the application status of Dualbeam in Chinese scientific research is discussed shortly, the important progress of Chinese researchers are introduced.