[1]李建国,安忠维.VO2薄膜相变特性以及制备与应用的研究进展[J].中国材料进展,2015,(11):056-60.[doi:10.7502/j.issn.1674-3962.2015.11.09]
　LI Jianguo,AN Zhongwei.Phase Transition Properties of Vanadium Dioxide Film and Research Progress of VO2 Thin FilmFabrication and Application[J].MATERIALS CHINA,2015,(11):056-60.[doi:10.7502/j.issn.1674-3962.2015.11.09]
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VO2薄膜相变特性以及制备与应用的研究进展()
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中国材料进展[ISSN:1674-3962/CN:61-1473/TG]

卷:
期数:
2015年第11期
页码:
056-60
栏目:
特约研究论文
出版日期:
2015-11-25

文章信息/Info

Title:
Phase Transition Properties of Vanadium Dioxide Film and Research Progress of VO2 Thin Film
Fabrication and Application
作者:
李建国; 安忠维
西安近代化学研究所
Author(s):
LI Jianguo;   AN Zhongwei
Xian Modern Chemistry Research Institute
关键词:
VO2薄膜; 相变温度; 制备方法; 原子层沉积(ALD); 掺杂
DOI:
10.7502/j.issn.1674-3962.2015.11.09
文献标志码:
A
摘要:
二氧化钒(VO2)薄膜是一种新型功能材料，其在68 ℃附近可发生低温半导体相与高温金属相(S-M)之间的可逆相变。伴随晶体结构的转变, VO2薄膜的电学、光学等物理性能发生突变，其性能的突变使得在热、电开关以及光存储方面有着广泛的应用而受到国内外越来越多的学者进行研究。但是，氧化钒存在相态复杂，VO2稳定存在相态范围狭窄，制备高纯度的VO2薄膜是现阶段国内外学者的研究重点。就近几年国内外相关研究，阐述了VO2薄膜的基本相变特性，介绍了常规的VO2薄膜制备方法和新型的以原子层沉积(ALD)技术制备VO2薄膜的方法，总结了通过改变薄膜制备工艺以及掺杂工艺降低VO2薄膜相变温度，进一步对VO2薄膜的应用方向、未来发展趋势进行展望。
Abstract:
The film of VO2  is a new functional material，and it has a reversible transition between low-temperature semiconductor phase and high-temperature metal phase(S-M) at about 68 ℃. With the transition in crystal structure, the electrical and optical physical properties appear mutation. The properties of VO2 films are widely applied in the thermal, electrical switch and optical storage, more and more scholars at home and abroad are engaged in related research. However, vanadium oxide phase states are quite complex, VO2 stable phase is in a narrow range, so preparation of high purity VO2 films is the researches emphasis and difficulty for all researcher. According to the domestic and international research, this paper briefly reviews the basic properties, and introduces common methods and atomic layer deposition(ALD) technology for preparation of VO2 thin films. Then,it reviews the methods of changing the films preparation and doping process to reduce the phase transition temperature. Application and development trend of VO2 films are discussed.
更新日期/Last Update: 2015-11-24