(Testing Laboratory for Nanostructures, National Center for Nanoscience and Technology, Beijing 100190, China)
Keywords:
-
CLC:
PACS:
-
DOI:
10.7502/j.issn.1674-3962.2013.12.03
DocumentCode:
Abstract:
The applications of Focused Ion Beam (FIB) /Scanning Electron Microscopy (SEM) DualBeam system at National Center for Nanoscience and Technology for micro-nanofabrication and characterization of nanomaterial are briefly reviewed by means of a lot of typical practical examples. Regarding characterization of nanomaterial, the capabilities, such as TEM sample preparation, Scanning Ion Microscopy (SIM), 2D and 3D characterization of nanomaterial, are illustrated. And as for micro-nanofabrication, the applications include: (1) direct milling for nanostructures, for instance, photonic array prototyping; (2) precise material deposition, for example, platinum metal deposition for four-electrode measurement; (3) site specific fabrication, such as AFM tip modification; (4)3D nanofabrication. (5) electron beam lithography (EBL) and its combination with FIB. The application fields of DualBeam system involve material science, electronics, life science and natural resources. To extend the application field, a number of new technologies, including various new types ion source, such as plasma, He+ and Ne+ are expected to be used in the near future to overcome some present disadvantages, for instance, low productivity, small fabrication area, bad fabrication precision, FIB induced damage and so on