[1]彭开武.FIB/SEM双束系统在微纳加工与表征中的应用[J].中国材料进展,2013,(12):728-734.[doi:10.7502/j.issn.1674-3962.2013.12.03]
　PENG Kaiwu.Applications of FIB/SEM DualBeam system for Micro-Nanofabrication and characterization[J].MATERIALS CHINA,2013,(12):728-734.[doi:10.7502/j.issn.1674-3962.2013.12.03]
点击复制

FIB/SEM双束系统在微纳加工与表征中的应用()
分享到：

中国材料进展[ISSN:1674-3962/CN:61-1473/TG]

卷:
期数:
2013年第12期
页码:
728-734
栏目:
特约研究论文
出版日期:
2013-12-31

文章信息/Info

Title:
Applications of FIB/SEM DualBeam system for Micro-Nanofabrication and characterization
作者:
彭开武
(国家纳米科学中心 纳米检测实验室,北京100190)
Author(s):
PENG Kaiwu
(Testing Laboratory for Nanostructures, National Center for Nanoscience and Technology, Beijing 100190, China)
关键词:
聚焦离子束、双束系统、纳米材料表征、纳米结构加工、电子束曝光、透射电镜样品制备
DOI:
10.7502/j.issn.1674-3962.2013.12.03
摘要:
简要回顾了聚焦离子束/扫描电子显微镜双束系统在国家纳米科学中心的应用。围绕纳米材料表征与纳米结构加工两方面，以一些具体实例分类进行了介绍。材料表征方面包括：透射电镜样品制备、扫描电子显微镜与扫描离子显微镜、纳米材料的二维与三维表征；微纳米结构加工方面包含：离子束直接刻蚀加工（如光子晶体阵列器件原型加工）、材料沉积加工（如用于电学性能测试的四电极制作）、指定点加工（如原子力显微镜针尖修饰）、三维加工、电子束曝光及其与聚焦离子束联合加工等。应用领域涉及材料科学、电子学、生命科学、工业应用等。针对限制其应用的一些不利因素，如加工效率低、面积小、精度不足、加工损伤等问题，一些新技术，如新型离子源Plasma、He+/Ne+离子等与现有Ga+聚焦离子束系统配合将是未来发展方向。
Abstract:
The applications of Focused Ion Beam (FIB) /Scanning Electron Microscopy (SEM) DualBeam system at National Center for Nanoscience and Technology for micro-nanofabrication and characterization of nanomaterial are briefly reviewed by means of a lot of typical practical examples. Regarding characterization of nanomaterial, the capabilities, such as TEM sample preparation, Scanning Ion Microscopy (SIM), 2D and 3D characterization of nanomaterial, are illustrated. And as for micro-nanofabrication, the applications include: (1) direct milling for nanostructures, for instance, photonic array prototyping; (2) precise material deposition, for example, platinum metal deposition for four-electrode measurement; (3) site specific fabrication, such as AFM tip modification; (4)3D nanofabrication. (5) electron beam lithography (EBL) and its combination with FIB. The application fields of DualBeam system involve material science, electronics, life science and natural resources. To extend the application field, a number of new technologies, including various new types ion source, such as plasma, He+ and Ne+ are expected to be used in the near future to overcome some present disadvantages, for instance, low productivity, small fabrication area, bad fabrication precision, FIB induced damage and so on

参考文献/References:

References
[1] Yao Nan(姚楠).FOCUSED ION BEAM SYSTEMS: Basics and Applications [M]. Cambridge University Press,2007.
[2] Richard Wirth. Focused Ion Beam (FIB) combined with SEM and TEM : Advanced analytical tools for studies of chemical composition, microstructure and crystal structure in geomaterials on a nanometer scale [J]. Chemical Geology 261 (2009) 217-229.
[3] Steve Reyntjens and Robert Puers. A review of focused ion beam applications in microsystem technology [J]. J. Micromech. Microeng. 11 (2001) 287–300.
[4] Jianming Zhang(张建明), Chuanfei Guo（郭传飞）, Haoran Zhang（张浩然） and Qian Liu（刘前）. One-step fabrication of micro/nanotunnels in metal Interlayers [J].Nanoscale. 2013 Jun 10 Pages:8351-8354.
[5] L.HOLZER, F.INDUTNYI, PH.GASSER, B. M?NCH & M. WEGMANN. Three-dimensional analysis of porous BaTiO3 ceramics using FIB nanotomography [J]. Journal of Microscopy, Vol. 216, Pt 1 October 2004, pp.84–95.
[6] Li Guan（关丽）, Kaiwu Peng（彭开武）, Yanlian Yang（杨延莲）, Xiaohui Qiu （裘晓辉）and Chen Wang（王琛）. The nanofabrication of polydimethylsiloxane using a focused ion beam[J]. Nanotechnology 20 (2009), 145301.
[7] Tzahi Cohen-Karni, Quan Qing, Qiang Li, Ying Fang, and Charles M. Lieber. Graphene and Nanowire Transistors for Cellular Interfaces and Electrical Recording [J]. Nano Lett. 2010 March 10; 10(3): 1098–1102.
[8] Ping Huang(黄平), Huarui Zhu(朱华瑞), Long Jing(景龙), Yuliang Zhao(赵宇亮), and Xueyun Gao(高学云). Graphene Covalently Binding Aryl Groups: Conductivity Increases Rather than Decreases [J]. ACS Nano, 2011, 5 (10), pp 7945–7949.
[9]CHEN Wen-xiong(陈文雄), XU Jun(徐军), ZHANG Jie-dong(张解东). Some ion optics topics in FIB(聚焦离子束 FIB中的离子光学问题)[J]. Journal of Chinese Electron Microscopy Society(电子显微学报) Vol21(第21卷) No4(第4 期)Vol 21, No4: 411-415.
[10] L.A. Giannuzzi and F.A.Stevie. Introduction to Focused Ion Beams: Instrumentation, Theory, Techniques and Practice [M]. Springer Press,2004.
[11]Ampere A Tseng. Recent developments in micromilling using focused ion beam technology [J]. J. Micromech. Microeng. 14 (2004) R15–R34.
[12] Ampere A Tseng. Recent Developments in Nanofabrication Using Focused Ion Beams [J]. small 2005, 1, No10: 924– 939

备注/Memo

备注/Memo:
收稿日期：2013-09-04 作者简介：彭开武（1971-），男，高级工程师（a）待表征的页岩样品（b）FIB截面加工后获取的第一张SEM图像（c）软件合成后的页岩孔隙分布图
更新日期/Last Update: 2013-12-03