[1]ÝþºÆ²©,ÁõÄþÌÎ,Îâ˼íµ,µÈ.Ñõ»¯ïصÄnÐͲôÔÓÑо¿½øÕ¹[J].Öйú²ÄÁϽøÕ¹,2023,42(04):277-288.[doi:10.7502/j.issn.1674-3962.202207018]
¡¡LIN Haobo,LIU Ningtao,WU Simiao,et al.Research Progress of n-Type Doping of Gallium Oxide[J].MATERIALS CHINA,2023,42(04):277-288.[doi:10.7502/j.issn.1674-3962.202207018]

µã»÷¸´ÖÆ

Ñõ»¯ïصÄnÐͲôÔÓÑо¿½øÕ¹()

·ÖÏíµ½£º

²Î¿¼ÎÄÏ×/References:

\[1\]PEARTON S J, REN F, TADJER M, et al. Journal of Applied Physics\[J\], 2018, 124(22): 220901. \[2\]HIGASHIWAKI M, SASAKI K, KURAMATA A, et al. Physica Status Solidi (a)\[J\], 2014, 211(1): 21-26. \[3\]PEARTON S J, YANG J, CARYIV P H, et al. Applied Physics Reviews\[J\], 2018, 5(1): 011301. \[4\]ROY R, HILL V G, OSBORN E F. Journal of the American Chemical Society\[J\], 1952, 74(3): 719-722. \[5\]YOSHIOKA S, HAYASHI H, KUWABARA A, et al. Journal of Physics: Condensed Matter\[J\], 2007, 19(34): 346211. \[6\]GELLER S. The Journal of Chemical Physics\[J\], 1960, 33(3): 676-684. \[7\]PEELAERS H, van de WALLE C G. Physical Review B\[J\], 2016, 94(19): 195203. \[8\]DONG L, JIA R, XIN B, et al. Scientific Reports\[J\], 2017, 7(1): 40160. \[9\]CHABAK K D, MCCANDLESS J P, MOSER N A, et al. IEEE Electron Device Letters\[J\], 2018, 39(1): 67-70. \[10\]XUE H, HE Q, JIAN G, et al. Nanoscale Research Letters\[J\], 2018, 13(1): 290. \[11\]KAUR D, KUMAR M. Advanced Optical Materials\[J\], 2021, 9(9): 2002160. \[12\]AFZAL A. Journal of Materiomics\[J\], 2019, 5(4): 542-557. \[13\]ZHANG J, SHI J, QI D C, et al. APL Materials\[J\], 2020, 8(2): 020906. \[14\]PING L K, BERHANUDDIN D D, MONDAL A K, et al. Chinese Journal of Physics\[J\], 2021, 73: 195-212. \[15\]PLAYFORD H Y, HANNON A C, TUCKER M G, et al. The Journal of Physical Chemistry C\[J\], 2014, 118(29): 16188-16198. \[16\]TAKANO Y, HAYASHI Y, FUKUSHIMA J, et al. Advanced Powder Technology\[J\], 2021, 32(3): 860-865. \[17\]HOU Y, WU L, WANG X, et al. Journal of Catalysis\[J\], 2007, 250(1): 12-18. \[18\]SESHADRI H, CHERALATHAN M, SINHA P K. Research on Chemical Intermediates\[J\], 2013, 39(3): 991-1001. \[19\]LIU H, WANG Z, LI H, et al. RSC Advances\[J\], 2018, 8(26): 14328-14334. \[20\]VASANTHI V, KOTTAISAMY M, RAMAKRISHNAN V. Ceramics International\[J\], 2019, 45(2, Part A): 2079-2087. \[21\]GAKE T, KUMAGAI Y, OBA F. Physical Review Materials\[J\], 2019, 3(4): 044603. \[22\]FORNARI R, PAVESI M, MONTEDORO V, et al. Acta Materialia\[J\], 2017, 140: 411-416. \[23\]PLAYFORD H Y, HANNON A C, BARNEY E R, et al. Chemistryª²A European Journal\[J\], 2013, 19(8): 2803-2813. \[24\]CORA I, MEZZADRI F, BOSCHI F, et al. CrystEngComm\[J\], 2017, 19(11): 1509-1516. \[25\]KIM J, TAHARA D, MIURA Y, et al. Applied Physics Express \[J\], 2018, 11(6): 061101. \[26\]RANGA P, CHO S B, MISHRA R, et al. Applied Physics Express\[J\], 2020, 13(6): 061009. \[27\]CHO S B, MISHRA R. Applied Physics Letters\[J\], 2018, 112(16): 162101. \[28\]DE¦BK P, DUY H Q, SEEMANN F, et al. Physical Review B\[J\], 2017, 95(7): 075208. \[29\]VARLEY J B, WEBER J R, JANOTTI A, et al. Applied Physics Letters\[J\], 2010, 97(14): 142106. \[30\]YAMAGA M, V¨ªLLORA E G, SHIMAMURA K, et al. Physical Review B\[J\], 2003, 68(15): 155207. \[31\]LORENZ M R, WOODS J F, GAMBINO R J. Journal of Physics and Chemistry of Solids\[J\], 1967, 28(3): 403-404. \[32\]OANH V T K, LEE D U, KIM E K. Journal of Alloys and Compounds\[J\], 2019, 806: 874-880. \[33\]GUO D Y, QIAN Y P, SU Y L, et al. AIP Advances\[J\], 2017, 7(6): 065312. \[34\]ZHANG T, GUAN D, LIU N, et al. Applied Physics Express\[J\], 2022, 15(2): 022007. \[35\]QIN Y, LONG S, HE Q, et al. Advanced Electronic Materials\[J\], 2019, 5(7): 1900389. \[36\]KING P D C, MCKENZIE I, VEAL T D. Applied Physics Letters\[J\], 2010, 96(6): 062110. \[37\]V¦PLLORA E G, SHIMAMURA K, YOSHIKAWA Y, et al. Applied Physics Letters\[J\], 2008, 92(20): 202120. \[38\]GOTO K, KONISHI K, MURAKAMI H, et al. Thin Solid Films\[J\], 2018, 666: 182-184. \[39\]ALEMA F, SERYOGIN G, OSINSKY A, et al. APL Materials\[J\], 2021, 9(9): 091102. \[40\]SIAH S C, BRANDT R E, LIM K, et al. Applied Physics Letters\[J\], 2015, 107(25): 252103. \[41\]GALAZKA Z, IRMSCHER K, UECKER R, et al. Journal of Crystal Growth\[J\], 2014, 404: 184-191. \[42\]DU X, LI Z, LUAN C, et al. Journal of Materials Science\[J\], 2015, 50(8): 3252-3257. \[43\]MA N, TANEN N, VERMA A, et al. Applied Physics Letters\[J\], 2016, 109(21): 212101. \[44\]FU B, JIAN G, MU W, et al. Journal of Alloys and Compounds \[J\], 2022, 896: 162830. \[45\]HOSHIKAWA K, KOBAYASHI T, OHBA E, et al. Journal of Crystal Growth\[J\], 2020, 546: 125778. \[46\]OHIRA S, SUZUKI N, ARAI N, et al. Thin Solid Films\[J\], 2008, 516(17): 5763-5767. \[47\]KAWAHARAMURA T, DANG G T, FURUTA M. Japanese Journal of Applied Physics\[J\], 2012, 51: 040207. \[48\]ONUMA T, FUJIOKA S, YAMAGUCHI T, et al. Journal of Crystal Growth\[J\], 2014, 401: 330-333. \[49\]JEON H M, LEEDY K D, LOOK D C, et al. APL Materials\[J\], 2021, 9(10): 101105. \[50\]RAFIQUE S, KARIM M R, JOHNSON J M, et al. Applied Physics Letters\[J\], 2018, 112(5): 052104. \[51\]OSHIMA T, MATSUYAMA K, YOSHIMATSU K, et al. Journal of Crystal Growth\[J\], 2015, 421: 23-26. \[52\]AHMADI E, KOKSALDI O S, KAUN S W, et al. Applied Physics Express\[J\], 2017, 10(4): 041102. \[53\]RANGA P, BHATTACHARYYA A, WHITTAKERª²BROOKS L, et al. Journal of Vacuum Science & Technology A\[J\], 2021, 39(3): 030404. \[54\]KNEI¢x M, HASSA A, SPLITH D, et al. APL Materials\[J\], 2019, 7(2): 022516. \[55\]KRACHT M, KARG A, SCH¦ZRMANN J, et al. Physical Review Applied\[J\], 2017, 8(5): 054002. \[56\]LANY S. APL Materials\[J\], 2018, 6(4): 046103. \[57\]GOGOVA D, WAGNER G, BALDINI M, et al. Journal of Crystal Growth\[J\], 2014, 401: 665-669. \[58\]BALDINI M, ALBRECHT M, FIEDLER A, et al. Journal of Materials Science\[J\], 2016, 51(7): 3650-3656. \[59\]COOKE J, RANGA P, JESENOVEC J, et al. Scientific Reports\[J\], 2022, 12(1): 3243. \[60\]NARESHª²KUMAR G, MACINTYRE H, SUBASHCHANDRAN S, et al. Physica Status Solidi (b)\[J\], 2021, 258(2): 2000465. \[61\]ZHOU W, XIA C, SAI Q, et al. Applied Physics Letters\[J\], 2017, 111(24): 242103. \[62\]LONG X, NIU W, WAN L, et al. Crystals\[J\], 2021, 11(2): 135. \[63\]SHANG Y, TANG K, CHEN Z, et al. Materials Science in Semiconductor Processing\[J\], 2021, 134: 106040. \[64\]CUI H, MOHAMED H F, XIA C, et al. Journal of Alloys and Compounds\[J\], 2019, 788: 925-928. \[65\]RUBIO E J, RAMANA C V. Applied Physics Letters\[J\], 2013, 102(19): 191913. \[66\]RUBIO E J, MATES T E, MANANDHAR S, et al. The Journal of Physical Chemistry C\[J\], 2016, 120(47): 26720-26735. \[67\]NARAYANAN M, PUNJAL A, HOSSAIN E, et al. arXiv preprint arXiv:220304941\[J\], 2022. \[68\]BATTU A K, MANANDHAR S, RAMANA C V. Advanced Materials Interfaces\[J\], 2017, 4(19): 1700378. \[69\]SALEH M, VARLEY J B, JESENOVEC J, et al. Semiconductor Science and Technology\[J\], 2020, 35(4): 04LT1. \[70\]YAN J, QU C. Journal of Semiconductors \[J\], 2016, 37(4): 042002. \[71\]MORIMOTO S, NISHINAKA H, YOSHIMOTO M. Thin Solid Films\[J\], 2019, 682: 18-23. \[72\]QIAN L X, GU Z, HUANG X, et al. ACS Applied Materials & Interfaces\[J\], 2021, 13(34): 40837-40846. \[73\]UM J H, CHOI B S, JEONG D H, et al. Electronic Materials Letters\[J\], 2021, 17(2): 142-147. \[74\]MALAKOUTIAN M, SONG Y, YUAN C, et al. Applied Physics Express\[J\], 2021, 14(5): 055502. \[75\]CHENG Z, WHEELER V D, BAI T, et al. Applied Physics Letters\[J\], 2020, 116(6): 062105. \[76\]VARLEY J B, JANOTTI A, FRANCHINI C, et al. Physical Review B\[J\], 2012, 85(8): 081109. \[77\]KYRTSOS A, MATSUBARA M, BELLOTTI E. Applied Physics Letters\[J\], 2018, 112(3): 032108. \[78\]TADJER M J, LYONS J L, NEPAL N, et al. ECS Journal of Solid State Science and Technology\[J\], 2019, 8(7): 3187-3194. \[79\]JIANG J, ZHANG J. Ceramics International\[J\], 2020, 46(2): 2409-2412. \[80\]CHIKOIDZE E, SARTEL C, YAMANO H, et al. Journal of Vacuum Science & Technology A\[J\], 2022, 40(4): 043401. \[81\]LYONS J L. Semiconductor Science and Technology\[J\], 2018, 33(5): 05LT2. \[82\]POLYAKOV A Y, SMIRNOV N B, SHCHEMEROV I V, et al. Applied Physics Letters\[J\], 2018, 113(14): 142102. \[83\]WONG M H, LIN C H, KURAMATA A, et al. Applied Physics Letters\[J\], 2018, 113(10): 102103. \[84\]YAN H, GUO Y, SONG Q, et al. Physica B: Condensed Matter\[J\], 2014, 434: 181-184. \[85\]TAO J, LU H L, GU Y, et al. Applied Surface Science\[J\], 2019, 476: 733-740. \[86\]CHEN X, JAGADISH C, YE J. Fundamental Properties and Power Electronic Device Progress of Gallium Oxide\[M\]. John Wiley & Sons, Ltd., 2021: 235-352.